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1

Ion Projection Lithography: Progress of European MEDEA & International Program

Rainer Kaesmaier, Hans Löschner

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 3.06 MB

english, 2000

2

Ion projection lithography: status of tool and mask developments

Rainer Kaesmaier, Albrecht Ehrmann, Hans Löschner

Journal:

Microelectronic Engineering

Year:

2001

Language:

english

File:

PDF, 1.14 MB

english, 2001

3

Resist process development for sub-100-nm ion projection lithography

S Hirscher, R Kaesmaier, W.-D Domke, A Wolter, H Löschner, E Cekan, C Horner, M Zeininger, J Ochsenhirt

Journal:

Microelectronic Engineering

Year:

2001

Language:

english

File:

PDF, 247 KB

english, 2001

4

Stability of DRAM-devices with respect to 75 keV helium ion beam irradiation as required for ion projection lithography of critical layers

S. Hirscher, M. Kümmel, A. Wolter, R. Kaesmaier, A. Jaeschke

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 240 KB

english, 2002

5

[IEEE 2009 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Berlin, Germany (2009.05.10-2009.05.12)] 2009 IEEE/SEMI Advanced Semiconductor Manufacturing Conference - A new surface analysis method for semiconductor manufacturing, based on surface-potential measurements

Schuetten, R., Kleber, M., Jerenz, M., Gregorius, I., Zimmermann, B., Kaesmaier, R., Hickson, J., Tamayo, N., Newcomb, R.

Year:

2009

Language:

english

File:

PDF, 410 KB

english, 2009

6

Ion projection lithography: International development program

R. Kaesmaier, H. Löschner, G. Stengl, J. C. Wolfe, P. Ruchhoeft

Year:

1999

Language:

english

File:

PDF, 740 KB

english, 1999

7

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Emerging Lithographic Technologies IV - Overview of the ion projection lithography European MEDEA and international program

Kaesmaier, Rainer, Loeschner, Hans, Dobisz, Elizabeth A.

Year:

2000

Language:

english

File:

PDF, 6.61 MB

english, 2000

8

SPIE Proceedings [SPIE 18th Annual BACUS Symposium on Photomask Technology and Management - Redwood City, CA (Wednesday 16 September 1998)] 18th Annual BACUS Symposium on Photomask Technology and Management - Stencil mask technology for ion beam lithography

Ehrmann, Albrecht, Huber, Sabine, Kaesmaier, Rainer, Oelmann, Andreas B., Struck, Thomas, Springer, Reinhard, Butschke, Joerg, Letzkus, Florian, Kragler, Karl, Loeschner, Hans, Rangelow, Ivo W., Greno

Year:

1998

Language:

english

File:

PDF, 2.53 MB

english, 1998

9

Experimental evaluation of an optimized radiation cooling geometry for ion projection lithography masks

J. L. Torres, H. N. Nounu, J. R. Wasson, J. C. Wolfe, J. Lutz, E. Haugeneder, H. Löschner, G. Stengl, R. Kaesmaier

Year:

2000

Language:

english

File:

PDF, 567 KB

english, 2000

10

Characterization of a process development tool for ion projection lithography

H. Loeschner, G. Stengl, R. Kaesmaier, A. Wolter

Year:

2001

Language:

english

File:

PDF, 1.20 MB

english, 2001

11

Directly sputtered stress-compensated carbon protective layer for silicon stencil masks

P. Hudek, P. Hrkút, M. Držik, I. Kostič, M. Belov, J. Torres, J. Wasson, J. C. Wolfe, A. Degen, I. W. Rangelow, J. Voigt, J. Butschke, F. Letzkus, R. Springer, A. Ehrmann, R. Kaesmaier, K. Kragler,

Year:

1999

Language:

english

File:

PDF, 934 KB

english, 1999

12

Measuring acid generation efficiency in chemically amplified resists with all three beams

C. R. Szmanda, R. L. Brainard, J. F. Mackevich, A. Awaji, T. Tanaka, Y. Yamada, J. Bohland, S. Tedesco, B. Dal’zotto, W. Bruenger, M. Torkler, W. Fallmann, H. Loeschner, R. Kaesmaier, P. M. Nealey, A.

Year:

1999

Language:

english

File:

PDF, 510 KB

english, 1999

13

High precision stress measurement of ion projection lithography mask membranes

J. L. Torres, J. C. Wolfe, P. Ruchhoeft, T. F. Kennedy, J. Podolski, K. Kragler, A. Ehrmann, R. Kaesmaier, H. Löschner

Year:

2002

Language:

english

File:

PDF, 823 KB

english, 2002

14

Status of Ion Projection Lithography

Bruenger, Wilhelm H., Kaesmaier, Rainer, Loeschner, Hans, Springer, Reinhard

Journal:

MRS Proceedings

Year:

2000

Language:

english

File:

PDF, 1.08 MB

english, 2000

15

SPIE Proceedings [SPIE 18th European Mask Conference on Mask Technology for Integrated Circuits and Micro-Components - Munich-Unterhaching, Germany (Tuesday 15 January 2002)] 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Measures to achieve 20nm IPL stencil mask distortion

Haugeneder, Ernst, Chalupka, A., Lammer, T, Loeschner, Hans, Kamm, Frank-Michael, Struck, Thomas, Ehrmann, Albrecht, Kaesmaier, Rainer, Wolter, Andreas, Butschke, Joerg, Irmscher, Mathias, Letzkus, Fl

Year:

2002

Language:

english

File:

PDF, 977 KB

english, 2002

16

SPIE Proceedings [SPIE 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Munich, Germany (Monday 15 November 1999)] 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Ion projection lithography: progress in mask and tool technology

Ehrmann, Albrecht, Kaesmaier, Rainer, Struck, Thomas, Behringer, Uwe F. W.

Year:

2000

Language:

english

File:

PDF, 3.21 MB

english, 2000

17

SPIE Proceedings [SPIE Photomask Technology and Management - Monterey, CA (Wednesday 15 September 1999)] 19th Annual Symposium on Photomask Technology - Placement measurement and FE modeling results for distortion control of stencil masks

Ehrmann, Albrecht, Struck, Thomas, Kaesmaier, Rainer, Haugeneder, Ernst, Loeschner, Hans, Butschke, Joerg, Letzkus, Florian, Irmscher, Mathias, Springer, Reinhard, Engelstad, Roxann L., Abboud, Frank

Year:

1999

Language:

english

File:

PDF, 787 KB

english, 1999

18

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Emerging Lithographic Technologies V - Ion projection lithography: advances with integrated tool and resist processes

Wolter, Andreas, Kaesmaier, Rainer, Loeschner, Hans, Dobisz, Elizabeth A.

Year:

2001

Language:

english

File:

PDF, 1.13 MB

english, 2001

19

SPIE Proceedings [SPIE International Symposium on Microelectronics and Assembly - Singapore, Singapore (Monday 27 November 2000)] Microlithographic Techniques in Integrated Circuit Fabrication II - Ion projection lithography: November 2000 status and sub-70-nm prospects

Kaesmaier, Rainer, Wolter, Andreas, Loeschner, Hans, Schunck, Stefan, Mack, Chris A., Yuan, XiaoCong

Year:

2000

Language:

english

File:

PDF, 1.39 MB

english, 2000

20

SPIE Proceedings [SPIE 18th European Mask Conference on Mask Technology for Integrated Circuits and Micro-Components - Munich-Unterhaching, Germany (Tuesday 15 January 2002)] 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Ion projection lithography (IPL): posters presented at the 5th Intrnational SEMATECH Next-Generation Lithography (NGL) workshop

Kaesmaier, Rainer, Loeschner, Hans, de Jager, Patrick W., Ehrmann, Albrecht, Hirscher, Stefan, Kragler, Karl, Springer, Reinhard, Stengl, Gerhard, Wolter, Andreas, Behringer, Uwe F. W.

Year:

2002

Language:

english

File:

PDF, 1.65 MB

english, 2002

21

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Emerging Lithographic Technologies VI - Large-field ion optics for projection and proximity printing and for maskless lithography (ML2)

Loeschner, Hans, Stengl, Gerhard, Buschbeck, Herbert, Chalupka, A., Lammer, Gertraud, Platzgummer, Elmar, Vonach, Herbert, de Jager, Patrick W., Kaesmaier, Rainer, Ehrmann, Albrecht, Hirscher, Stefan,

Year:

2002

Language:

english

File:

PDF, 1.60 MB

english, 2002

22

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Wednesday 13 September 2000)] 20th Annual BACUS Symposium on Photomask Technology - Ion projection lithography: new insights and results of this NGL technology

Struck, Thomas, Ehrmann, Albrecht, Kaesmaier, Rainer, Loeschner, Hans, Grenon, Brian J., Dao, Giang T.

Year:

2001

Language:

english

File:

PDF, 784 KB

english, 2001

23

SPIE Proceedings [SPIE 15th European Conference on Mask Technology for Integrated Circuits and Micro-Components - Munich, Germany (Monday 16 November 1998)] 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98 - Ion projection lithography for IC manufacturing

Ehrmann, Albrecht, Kaesmaier, Rainer, Loeschner, Hans, Behringer, Uwe F. W.

Year:

1999

Language:

english

File:

PDF, 1.22 MB

english, 1999

24

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Emerging Lithographic Technologies IV - Stress engineering of SOI silicon stencil masks by boron doping concentration

Degen, Artur, Voigt, Jens, Kratzenberg, Martin, Shi, Feng, Butschke, Joerg, Loeschner, Hans, Kaesmaier, Rainer, Ehrmann, Albrecht, Rangelow, Ivo W., Dobisz, Elizabeth A.

Year:

2000

Language:

english

File:

PDF, 1.12 MB

english, 2000

25

SPIE Proceedings [SPIE 15th European Conference on Mask Technology for Integrated Circuits and Micro-Components - Munich, Germany (Monday 16 November 1998)] 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98 - PN and SOI wafer flow process for stencil mask fabrication

Butschke, Joerg, Ehrmann, Albrecht, Haugeneder, Ernst, Irmscher, Mathias, Kaesmaier, Rainer, Kragler, Karl, Letzkus, Florian, Loeschner, Hans, Mathuni, Josef, Rangelow, Ivo W., Reuter, Carsten, Shi, F

Year:

1998

Language:

english

File:

PDF, 1.58 MB

english, 1998

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